The application of a skid resistance deterioration model to various New Zealand aggregates

A number of studies have been undertaken to help predict infield long-term skid resistance performance. The Polished Stone Value (PSV) test is the oldest and the most common test used worldwide to rank the skid resistance performance of road surfaces. Due to certain limitations of the PSV test, other laboratory test methodologies have been developed as potential alternatives. One of the limitations of the PSV test is that it only provides end of test results, whereas it is desirable to observe the skid resistance deterioration trend during the polishing process, in particular for research applications. This paper discusses the application of a mathematical model, originally developed for asphaltic concrete surfaces, to predict the skid resistance deterioration trend under polishing for a range of New Zealand chip seal aggregates. A laboratory skid resistance testing device, known as the Wehner/Schulze device, was used for this study since the model was originally derived based on test results obtained using this type of device. It was found that the model was capable of replicating the skid resistance deterioration trend under laboratory polishing of the chip seal aggregates used in this research. It was also found that the model coefficients were dependent on aggregate geological types, and thus suggested that a set of coefficients obtained for a specific aggregate source may be able to provide information on infield skid resistance performance of that specific aggregate type, if the model is found to be capable of replicating skid resistance deterioration trends in the field as well. As part of future research, the model will be calibrated against infield skid resistance.

Language

  • English

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Filing Info

  • Accession Number: 01688953
  • Record Type: Publication
  • Source Agency: Institut Francais des Sciences et Technologies des Transports, de l'Amenagement et des Reseaux (IFSTTAR)
  • Files: ITRD
  • Created Date: Dec 18 2018 10:19AM